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Dergiler / Turkish Journal of Chemistry / 2013 / Cilt: 37 - Sayı: 5

Aerosol-assisted chemical vapor deposition of copper sulfide nanostructured thin film from newly synthesized single-source precursor

Sohail SAEED
Naghmana RASHID
Khuram Shahzad AHMAD
Sayfa
796–804
Yayın Tarihi
2013-05-01
DOI
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The scanning electron microscopy and energy dispersive X-ray analysis results showed the uniform distribution of copper sulfide in the film, which makes it a useful semiconducting material on a structured surface.

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Amaç & Hipotez:The copper(II) complex of N-[ethyl(butyl)carbamothioyl]- 3,5-dinitrobenzamide (1) has been synthesized and characterized by elemental analysis, IR spectroscopy, and atmospheric pressure chemical ionization-mass spectrometry.
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Temel Bulgular & Veri:Thermogravimetric analysis shows that complex 2 decomposes in 2 steps to form copper sulfide.
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Sonuç & Katkı:The scanning electron microscopy and energy dispersive X-ray analysis results showed the uniform distribution of copper sulfide in the film, which makes it a useful semiconducting material on a structured surface.
🔬Tür:Araştırma Makalesi
📍Kapsam:Genişletilmiş Akademik Örneklem
⚙️Değişkenler:Copper complex · thin film · aerosol-assisted chemical vapor deposition

Özet

The copper(II) complex of N-[ethyl(butyl)carbamothioyl]- 3,5-dinitrobenzamide (1) has been synthesized and characterized by elemental analysis, IR spectroscopy, and atmospheric pressure chemical ionization-mass spectrometry. Thermogravimetric analysis shows that complex 2 decomposes in 2 steps to form copper sulfide. The complex was used as a single-source precursor for the deposition of copper sulfide thin film by aerosol-assisted chemical vapor deposition at 350 °C. The powder X-ray diffraction pattern of thin film of the complex showed the deposition of monoclinic roxbyite Cu7S4 and orthorhombic anilite Cu7S4 phases at 350 °C with spherical crystallites. The degree of film surface roughness was determined by atomic force microscopy. The scanning electron microscopy and energy dispersive X-ray analysis results showed the uniform distribution of copper sulfide in the film, which makes it a useful semiconducting material on a structured surface.

Abstract

The copper(II) complex of N-[ethyl(butyl)carbamothioyl]- 3,5-dinitrobenzamide (1) has been synthesized and characterized by elemental analysis, IR spectroscopy, and atmospheric pressure chemical ionization-mass spectrometry. Thermogravimetric analysis shows that complex 2 decomposes in 2 steps to form copper sulfide. The complex was used as a single-source precursor for the deposition of copper sulfide thin film by aerosol-assisted chemical vapor deposition at 350 °C. The powder X-ray diffraction pattern of thin film of the complex showed the deposition of monoclinic roxbyite Cu7S4 and orthorhombic anilite Cu7S4 phases at 350 °C with spherical crystallites. The degree of film surface roughness was determined by atomic force microscopy. The scanning electron microscopy and energy dispersive X-ray analysis results showed the uniform distribution of copper sulfide in the film, which makes it a useful semiconducting material on a structured surface.

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Bu Makaleye Atıf Yap

SAEED, S., RASHID, N., AHMAD, K. S. (2013). Aerosol-assisted chemical vapor deposition of copper sulfide nanostructured thin film from newly synthesized single-source precursor. Turkish Journal of Chemistry, Cilt: 37 - Sayı: 5, 796–804. https://ajindex.com/articles/182385

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