Journals / Iğdır Üniversitesi Fen Bilimleri Enstitüsü Dergisi / 2020 / Cilt: 10 - Sayı: 1

The Effect of Measurement Frequency on Dielectric Characteristics in Al/P-Si Structures with Interfacial Native Oxide Layer

Arayüzey Doğal Oksit Tabakalı Al/p-Si/Al Yapıların Dielektrik Karakteristiklerine Ölçüm Frekansının Etkileri

Pages
91–100
Publication Date
2020-03-01
DOI
—
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AI Summary & Key Takeaways

AI Insight
⚡ TL;DR(Too Long; Didn't Read)

In order to obtain diode parameters, it was determined the experimental frequency admittance characteristics of the Al/p-Si MIS structure from commonly used capacitance-voltage (C-V) conductance-voltage (G-V) measurements at different frequencies, and parameters such as the real 𝜀′ and imaginary dielectric 𝜀′′ constant, loss-tangent (𝜀′′/𝜀′), real 𝑀′ and imaginary electrical modulus 𝑀′′ and ac conductivity σac were calculated and interpreted.

📌 3 Key Takeaways

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Objective & Hypothesis:Al/p-Si/Al metal/oxide layer/semiconductor or so-called metal/insulating layer/semiconductor (MIS) structures with interfacial native oxide layer are experimentally determined.
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Key Findings & Data:For this structure, p-Si semiconductor with 1-10 Ω-cm resistivity was used as base material.
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Conclusion & Impact:In order to obtain diode parameters, it was determined the experimental frequency admittance characteristics of the Al/p-Si MIS structure from commonly used capacitance-voltage (C-V) conductance-voltage (G-V) measurements at different frequencies, and parameters such as the real 𝜀′ and imaginary dielectric 𝜀′′ constant, loss-tangent (𝜀′′/𝜀′), real 𝑀′ and imaginary electrical modulus 𝑀′′ and ac conductivity σac were calculated and interpreted.
🔬Design:Research Article
📍Scope:Comprehensive Sample
⚙️Variables:Metal/oksit tabaka/yarıiletken (MOS) · Schottky diyotlar · Özellikler

Abstract

Al/p-Si/Al metal/oxide layer/semiconductor or so-called metal/insulating layer/semiconductor (MIS) structures with interfacial native oxide layer are experimentally determined. For this structure, p-Si semiconductor with 1-10 Ω-cm resistivity was used as base material. The native oxide SiO2 layer was formed on the front polished surface the p-Si wafer in the laboratory environment. In order to obtain diode parameters, it was determined the experimental frequency admittance characteristics of the Al/p-Si MIS structure from commonly used capacitance-voltage (C-V) conductance-voltage (G-V) measurements at different frequencies, and parameters such as the real 𝜀′ and imaginary dielectric 𝜀′′ constant, loss-tangent (𝜀′′/𝜀′), real 𝑀′ and imaginary electrical modulus 𝑀′′ and ac conductivity σac were calculated and interpreted.

Özet

Deneysel olarak karakteristiklerini belirlemeye çalıştığımız arayüzey doğal oksit tabakalı Al/p-Si/Al metal/oksit tabaka/yarıiletken veya diğer bir adıyla metal/yalıtkan tabaka/yarıiletken (MIS) yapılar elde edilmiştir. Bu yapı için taban malzeme olarak 1-10 Ω-cm özdirençli p-Si yarıiletkeni kullanılmıştır. Arka yüzeyi omik kontaklı olan bu p-Si dilim, laboratuvar ortamında ön parlak yüzeyi üzerinde doğal oksit SiO2 tabakasının oluşması sağlanmıştır. Diyot parametrelerinin elde edilmesi için, yaygın olarak kullanılan, farklı frekanslarda kapasite-gerilim (C-V) kondüktans-gerilim (G-V) ölçümlerinden Al/p-Si MIS yapının deneysel frekans admittans karakteristikleri elde edilmiştir. Bu karakteristiklerinden, gerçek 𝜀′ ve sanal dielektrik 𝜀′′ sabiti, loss-tanjant (𝜀′′/𝜀′), gerçek 𝑀′ ve sanal elektriksel modulüs 𝑀′′ ve ac iletkenliği 𝜎𝑎𝑐 gibi parametreleri hesaplanmış ve gerekli grafikler çizimleri ve yorumları yapılmıştır.

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Cite This Article

ÖZDEMİR, M. C., SEVGİLİ, Ö., ORAK, İ., TÜRÜT, A. (2020). The Effect of Measurement Frequency on Dielectric Characteristics in Al/P-Si Structures with Interfacial Native Oxide Layer. Iğdır Üniversitesi Fen Bilimleri Enstitüsü Dergisi, Cilt: 10 - Sayı: 1, 91–100. https://ajindex.com/articles/256958

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