Effect of Thermal Annealing Time on The Optical Characteristics of CuO Thin Films

Özet

In this study, annealing time effect has been investigated on the optical characteristics of copper oxide thin films prepared by spray method. X-ray diffraction (XRD) measurements determined that the copper oxide films, produced on glass substrate using the 0.1 M copper-II-acetate monohydrate [Cu(CH3COO)2H2O] precursor solution at 250 °C in the CuO tenorite phase. The films produced at 250 oC subsequently annealed at 450 oC for half an hour intervals and as optically have been characterized. When the film annealed at 450 oC; it was observed that after the first annealing process the film transmittance and band gap energy were decreased, longer annealing process did not change significantly the optical transmittance and the band gap of CuO film. Optical band gap values of film obtained from transmittance measurements; for as deposited and 0.5 h, 1 h, 1.5 h, 2 h and 2.5 h annealed films; 1.71 eV, 1.60 eV, 1.59 eV, 1.61 eV, 1.58 eV, 1.58 eV were calculated respectively.