Microstructure and Mechanical Properties of TiN/TiCN/TiC Multilayer Thin Films Deposited by Magnetron Sputtering

Abstract

Enhancement of scratch and hardness mechanical properties of TiN/TiCN/TiC multilayer thin films deposited on commercially pure Titanium (Cp-Ti) and silicon (Si) substrates via magnetron sputtering technique were investigated in this study. The structural, chemical and mechanical properties of the coatings were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), nanoindentation and scratch tests. Results of the XRD analysis showed reflections corresponded to cubic and polycrystalline structure for TiN/TiCN/TiC films. XPS analysis of the uppermost layer of TiN/TiCN/TiC film revealed that titanium nitride and titanium carbide were formed in the coatings. According to SEM cross-sectional images, the coatings demonstrated dense structure as well as good adhesion to the substrate with a thickness of 3.035 μm. Nanoindentation hardness and critical load valueof scratch test results of TiN/TiCN/TiCmultilayer filmcoated on Cp-Ti substrate materials obtained 19.75 GPa and 21 N, respectively.