Effect of UV and gamma rays on bulk etching of the Pokalon track detector

Abstract

Solid-state nuclear track detectors (SSNTDs) nd applications in many elds of science and technology.Polycarbonates like CR-39 or Lexan are most widely used for such applications. Pokalon is a relatively new memberof the polycarbonate family of SSNTDs. It has the same monomer as that of Makrofol. In the present work we havestudied the bulk etching characteristics of Pokalon at different temperatures and normalities of NaOH etchant withand without magnetic stirring. The effect of UV and gamma irradiation on the bulk etch rate has also been studied.From the bulk etch rate values at different temperatures, we have determined the corresponding activation energies.Measurable enhancement of the bulk etch rates with accompanying reduction in the activation energies following UVand gamma irradiation suggests chain scission and bond breaking as possible mechanisms for these changes in the etchingcharacteristics.