Journals / Uluslararası Mühendislik Araştırma ve Geliştirme Dergisi / 2022 / Cilt: 14 - Sayı: 2

Electrical, Optical and Structural Analysis Depending on Concentration of TiO Thin Films Produced via Dip-Coating Method

Daldırma Metodu ile Üretilen TiO İnce Filmlerin Derişime Bağlı Elektriksel, Optik ve Yapısal Analizi

Pages
590–603
Publication Date
2022-07-31
DOI
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AI Summary & Key Takeaways

AI Insight
⚡ TL;DR(Too Long; Didn't Read)

The increase in the electrical resistivity values with increasing concentration is evidence that the exhibits a typical metal-like behavior due to the particular conductivity in the oxide sub-layers.

📌 3 Key Takeaways

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Objective & Hypothesis:In this study, TiO thin films were produced on glass lamels by Dip-Coating method at 2 times 5 seconds into solutions prepared at different concentrations (A1:0.8 Molar, A2:1,25x10-2 Molar, A3:2, 5x10-3 Molar) and these films were annealed at 500 °C.
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Key Findings & Data:In general, these films with an amorphous structure have 2θ = 25,5° (1 0 1) a spread was observed at the Miller orientation peak.
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Conclusion & Impact:The increase in the electrical resistivity values with increasing concentration is evidence that the exhibits a typical metal-like behavior due to the particular conductivity in the oxide sub-layers.
🔬Design:Research Article
📍Scope:Comprehensive Sample
⚙️Variables:İnce Tabaka · Daldırma-Kaplama · TiO2

Abstract

In this study, TiO thin films were produced on glass lamels by Dip-Coating method at 2 times 5 seconds into solutions prepared at different concentrations (A1:0.8 Molar, A2:1,25x10-2 Molar, A3:2, 5x10-3 Molar) and these films were annealed at 500 °C. In general, these films with an amorphous structure have 2θ = 25,5° (1 0 1) a spread was observed at the Miller orientation peak. With a decrease in the concentration, small grains have changed from a spherical shape to an ellipse of larger and smaller sizes. While there is a lot of reflectivities in the UV region, their transmittance values are quite high in the visible region of 400-700 nm. The energy band gap values of TiO thin films with A1, A2 and A3 concentrations were calculated as Eg = 3.52 eV; 2.60 eV and 3.03 eV, respectively. The increase in the electrical resistivity values with increasing concentration is evidence that the exhibits a typical metal-like behavior due to the particular conductivity in the oxide sub-layers.

Özet

Bu çalışmada, farklı derişimlerde (A1: 0,8 Molar, A2: 1,25x10-2 Molar, A3: 2,5x10-3 Molar) hazırlanan çözeltilere 2 şer kez 5 saniye daldırma metodu (Dip-coating) ile cam lameller üzerine TiO ince filmleri üretilmiştir ve üretilen bu filmler 500 °C’ de tavlanmıştır. Genel olarak amorf yapıya sahip bu filmlerin 2θ = 25,5° (1 0 1) Miller yönelim pikinde yayılma görülmüştür. Derişimin azalması ile küçük taneli yapılar, küresel şekilden daha irili ufaklı elipse doğru değişim göstermiştir. UV bölgede yansıtma özelliği oldukça fazla iken 400-700 nm görünür bölgede ise geçirgenlikleri oldukça fazladır. A1, A2 ve A3 derişimli TiO ince filmlerin enerji bant aralığı değerleri sırası ile Eg = 3,52 eV; 2,60 eV ve 3,03 eV olarak hesaplanmıştır. Derişimin artması ile elektriksel özdirenç değerlerinin artması, oksit alt tabakalardaki özel iletkenlikten dolayı metal benzeri tipik bir davranış gösterdiğinin kanıtıdır.

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Cite This Article

TEZEL, N. S., TEZEL, F. M., KARİPER, A. (2022). Electrical, Optical and Structural Analysis Depending on Concentration of TiO Thin Films Produced via Dip-Coating Method. Uluslararası Mühendislik Araştırma ve Geliştirme Dergisi, Cilt: 14 - Sayı: 2, 590–603. https://ajindex.com/articles/889114

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