Journals / Cumhuriyet Science Journal / 2020 / Cilt: 41 - Sayı: 4

Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering

Pages
929–937
Publication Date
2022-10-12
DOI
—
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AI Summary & Key Takeaways

AI Insight
⚡ TL;DR(Too Long; Didn't Read)

Experimental results showthat annealing has an important role in the changes observed in the characterization of theGallium Oxide thin films.

📌 3 Key Takeaways

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Objective & Hypothesis:In the present work, Gallium Oxide (Ga2O3) were deposited as thin films by radio frequency(RF) magnetron sputtering at 300 °C substrate temperature on glass substrate using Ga2O3target with 99.99% purity.
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Key Findings & Data:All thin films produced were amorphous, except for the annealedP4-500.
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Conclusion & Impact:Experimental results showthat annealing has an important role in the changes observed in the characterization of theGallium Oxide thin films.
🔬Design:Research Article
📍Scope:Comprehensive Sample
⚙️Variables:Domain Parameters

Abstract

In the present work, Gallium Oxide (Ga2O3) were deposited as thin films by radio frequency(RF) magnetron sputtering at 300 °C substrate temperature on glass substrate using Ga2O3target with 99.99% purity. The crystalline structure, morphology, optical properties of theGallium Oxide films were determined using X-ray diffraction (XRD), scanning electronmicroscopy (SEM) and UV–Visible Spectrometry, respectively. Experimental results showthat annealing has an important role in the changes observed in the characterization of theGallium Oxide thin films. All thin films produced were amorphous, except for the annealedP4-500. SEM pictures reveal the morphology of prepared Gallium Oxide thin films. Therefractive index and real part of complex dielectric constant increased as the film depositionpressure increased

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Cite This Article

ÖZER, A., MOBTAKERİ, S., TÜZEMEN, E. Ş., GÜR, E. (2022). Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering. Cumhuriyet Science Journal, Cilt: 41 - Sayı: 4, 929–937. https://ajindex.com/articles/478064

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References (15)

  1. Litimein F., Rached D., Khenata R., Baltache H., FPLAPW study of the structural, electronic and optical properties of Ga2O3: Monoclinic and hexagonal phases, Journals of Alloys and Compounds, 488 (2009) 148-156
  2. Machon D., McMillan P. F., Xu B., Dong J., High pressure study of the β-to-α transition in Ga2O3, Physical Review B, 73 (2006) 094125
  3. Zinkevich M., Aldinger F., Thermodynamic Assessment of the Gallium-Oxygen System, Journal of the American Ceramic Society, 87 (2004) 683-691
  4. Geller S., Crystal structure of -Ga2O3, The Journal of Chemical Physics, 33 (1960) 676-684
  5. Ortiz A., Alonso J. C., Andrade E., Urbiola C., Structural and Optical Characteristics of Gallium Oxide Thin Films Deposited by Ultrasonic Spray Pyrolysis, Journal of The Electrochemical Society, 148 (2001) F26-F29
  6. Ji Z., Du J., Fan J., Wang W., Gallium oxide films for filter and solar-blind UV detector, Optical Materials, 28 (2006) 415-417
  7. Kokubun Y., Miura K., Endo F., Nakagomi S., Sol-gel prepared β-Ga2O3 thin films for ultraviolet photodetectors, Applied Physics Letters, 90, (2009) 031912: 1-031912:3
  8. Oshima T., Okuno T., Arai N., Suzuki N., Hino H., Fujita S., Flame Detection by a β-Ga2O3- Based Sensor, Japanese Journal of Applied Physics, 48 (2009) 011605: 1-011605:7
  9. Al-Kuhaili M. F., Durani S. M. A., Khawaja E. E., Optical properties of gallium oxide films deposited by electron-beam evaporation, Applied Physics Letters, 83 (2003) 4533-4535
  10. Miyata T., Nakatani T., Minami T., Manganeseactivated gallium oxide electroluminescent phosphor thin films prepared using various deposition methods, Thin Solid Films, 373 (2000) 145-149
  11. Fleischer M., Meixner H., Characterization and crystallite growth of semiconducting hightemperature stable Ga2O3 thin films, Journal of Materials Science Letters, 11 (1992) 1728-1731
  12. Marie P., Portier X., Cardin J., Growth and characterization of gallium oxide thin films by radiofrequency magnetron sputtering, Physica Status Solidi (a), 205 (2008) 1943-1946
  13. Hao J., Lou Z., Renaud I., Cocivera M., Electroluminescence of europium doped gallium oxide thin films, Thin Solid Films, 467 (2004) 182-185
  14. Oldham N. C., Hill C. J., Garland C. M., McGill T. C., Deposition of Ga2O3-x ultrathin films on GaAs by e-beam evaporation, Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 20 (2002) 809-813
  15. Passlack M., Hunt N. E. J., Schubert E. F., Zydzik G. J., Hong M., Mannaerts J. P