Journals / Bor Dergisi / 2026 / Cilt: 11 Sayı: 1

Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method

LPCVD yöntemiyle dielektrik yüzeyler üzerinde ultra ince hekzagonal bor nitrürün büyüme koşullarının optimizasyonu

Meryem Bozkaya(GAZİ ÜNİVERSİTESİ)0000-0001-5711-9369
Muhammet Nasuh Arik(TÜRKİYE ENERJİ NÜKLEER ve MADEN ARAŞTIRMA KURUMU BOR ARAŞTIRMA ENSTİTÜSÜ (TENMAK-BOREN))0000-0002-1526-803X
Ali Altuntepe(Sİvas Bİlim ve Teknoloji Üniversitesi Optik Mükemmeliyet Uygulama ve Araştırma Merkezi)0000-0002-6366-4125
Recep Zan(NIGDE OMER HALISDEMIR UNIVERSITY)0000-0001-6739-4348
Pages
13–21
Publication Date
2026-03-31
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AI Summary & Key Takeaways

AI Insight
⚡ TL;DR(Too Long; Didn't Read)

The results demonstrate that the optimized LPCVD process allows for the precise control of h-BN synthesis on dielectric surfaces, eliminating the need for metal catalysts and complex transfer processes for optoelectronic applications.

📌 3 Key Takeaways

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Objective & Hypothesis:In this study, the direct and transfer-free synthesis of ultrathin hexagonal Boron Nitride (h BN) films on non-catalytic quartz substrates was investigated using the Low-Pressure Chemical Vapor Deposition (LPCVD) method.
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Key Findings & Data:The effects of key growth parameters, including growth duration (15-90 min), precursor amount (50-200 mg), and precursor decomposition temperature (80-100°C), were systematically investigated to achieve high quality film growth.
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Conclusion & Impact:The results demonstrate that the optimized LPCVD process allows for the precise control of h-BN synthesis on dielectric surfaces, eliminating the need for metal catalysts and complex transfer processes for optoelectronic applications.
🔬Design:Araştırma Makalesi
📍Scope:Comprehensive Sample
⚙️Variables:LPCVD · h-BN ince film · katalitik olmayan etki

Abstract

In this study, the direct and transfer-free synthesis of ultrathin hexagonal Boron Nitride (h BN) films on non-catalytic quartz substrates was investigated using the Low-Pressure Chemical Vapor Deposition (LPCVD) method. The effects of key growth parameters, including growth duration (15-90 min), precursor amount (50-200 mg), and precursor decomposition temperature (80-100°C), were systematically investigated to achieve high quality film growth. Spectroscopic characterization confirmed the formation of the h-BN phase, with Raman spectra exhibiting the characteristic E2g vibrational mode and FT-IR analysis showing the distinct B-N stretching and B-N-B bending bonds at 1370 and 800 cm-1, respectively. UV-Vis spectroscopy revealed high optical transparency (>95%) in the visible region, and Tauc plot analysis yielded an optical bandgap of 5.68 eV. This widening of the bandgap relative to bulk h-BN (~5.2 eV) provides quantitative evidence of the few-layer nature of the films due to the quantum confinement effect. The results demonstrate that the optimized LPCVD process allows for the precise control of h-BN synthesis on dielectric surfaces, eliminating the need for metal catalysts and complex transfer processes for optoelectronic applications.

Özet

Bu çalışmada, katalitik olmayan kuvars altlıklar üzerinde ultra ince altıgen Bor Nitrür (h-BN) filmlerinin doğrudan ve transfer gerektirmeyen sentezi, Düşük Basınçlı Kimyasal Buhar Biriktirme (LPCVD) yöntemi kullanılarak incelenmiştir. Yüksek kaliteli film büyümesini elde etmek amacıyla büyüme süresi (15–90 dk), prekürsör miktarı (50–200 mg) ve prekürsör ayrışma sıcaklığı (80–100°C) gibi temel büyüme parametrelerinin etkileri sistematik olarak araştırılmıştır. Spektroskopik karakterizasyon, Raman spektrumlarında karakteristik E₂g titreşim modunun gözlenmesi ve FT-IR analizinde sırasıyla 1370 ve 800 cm⁻¹’de belirgin B–N gerilme ve B–N–B bükülme bağlarının tespit edilmesiyle h-BN fazının oluşumunu doğrulamıştır. UV-Vis spektroskopisi, görünür bölgede yüksek optik geçirgenlik (> %95) olduğunu ortaya koymuş ve Tauc grafiği analizi optik bant aralığını 5,68 eV olarak belirlemiştir. Yığın h-BN’e (~5,2 eV) kıyasla bant aralığındaki bu artış, kuantum sınırlama etkisi nedeniyle filmlerin birkaç katmanlı doğasına dair nicel kanıt sunmaktadır. Elde edilen sonuçlar, optimize edilmiş LPCVD sürecinin dielektrik yüzeyler üzerinde h-BN sentezinin hassas şekilde kontrol edilmesine olanak tanıdığını ve optoelektronik uygulamalar için metal katalizörler ile karmaşık transfer süreçlerine olan ihtiyacı ortadan kaldırdığını göstermektedir.

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Cite This Article

Bozkaya, M., Arik, M. N., Altuntepe, A., Ateş, H., Zan, R. (2026). Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD method. Bor Dergisi, Cilt: 11 Sayı: 1, 13–21. https://doi.org/10.30728/boron.1840796

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