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Journals / Pamukkale Üniversitesi Mühendislik Bilimleri Dergisi / 2018 / Cilt: 24 Sayı: 7

Characterization and preparation of transparent NiO thin films growth by electrochemical deposition technique

Elektrokimyasal büyütme tekniğiyle büyütülen geçirgen NiO ince filmlerin hazırlanması ve karakterizasyonu

Kübra Çınar Demir

Pages
1315–1324
Publication Date
2018-12-28
DOI
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Özet

Normal 0 false false false TR X-NONE X-NONE /* Style Definitions */ table.MsoNormalTable {mso-style-name:"Normal Tablo"; mso-tstyle-rowband-size:0; mso-tstyle-colband-size:0; mso-style-noshow:yes; mso-style-priority:99; mso-style-parent:""; mso-padding-alt:0cm 5.4pt 0cm 5.4pt; mso-para-margin-top:0cm; mso-para-margin-right:0cm; mso-para-margin-bottom:10.0pt; mso-para-margin-left:0cm; line-height:115%; mso-pagination:widow-orphan; font-size:11.0pt; font-family:"Calibri",sans-serif; mso-ascii-font-family:Calibri; mso-ascii-theme-font:minor-latin; mso-hansi-font-family:Calibri; mso-hansi-theme-font:minor-latin; mso-bidi-font-family:"Times New Roman"; mso-bidi-theme-font:minor-bidi; mso-ansi-language:TR;} ITO altlık üzerine geçirgen NiO (nikel oksit)   ince filmler farklı katodik akımlarda elektrokimyasal büyütme tekniği ile büyütülmüştür. Büyütme sonrası filmler 350 °C’de hava ortamında 2 sa. tavlanmıştır. X-ışını kırınım (XRD) örnekleri altlık üzerine büyütülen filmlerin (111), (200) ve (222) yönelimlere sahip tek fazlı kübik yapılı polikristal olduklarını göstermiştir.   Soğurma ölçümleriyle büyütülen NiO filmlerin band aralığı 2.85 eV olarak hesaplanmıştır. 310-800 nm aralığında alınan Fotolüminesans (PL) ölçümlerinden NiO ince filmlerin üç emisyon pikine sahip olduğu görülmüştür. Taramalı elektron mikroskobu (SEM) ve atomik kuvvet mikroskobu (AFM) ile büyütülen filmlerin yüzey morfolojisi incelenmiştir. Fourier Dönüşümlü İnfrared Spektroskopi (FTIR) analizleriyle filmlerin oluşumunda Ni-O bağların titreşim modlarına sahip olduğu ortaya çıkarılmış ve filmlerin görünür bölgede %50 ile %80 arasında ortalama bir optik geçirgenliğe sahip olduğu görülmüştür. XPS ölçümleri Ni/O yönelimi ve farklı büyütme koşullarına bağlı olarak büyütülen NiO filmlerin kimyasal bağlanma durumları gibi kimyasal özelliklerini incelemek için gerçekleştirilmiştir. Raman ölçümleri elektrokimyasal olarak büyütülen NiO filmlerinin stokiyometrik olmadığını göstermiştir. Görüldüğü gibi, NiO nanoparçacıkların yoğunluğu ve morfolojisinin optoelektronik aygıtların oluşumunda oldukça önemli olduğu anlaşılmıştır.

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Cite This Article

Demir, K. Ç. (2018). Characterization and preparation of transparent NiO thin films growth by electrochemical deposition technique. Pamukkale Üniversitesi Mühendislik Bilimleri Dergisi, Cilt: 24 Sayı: 7, 1315–1324. https://ajindex.com/articles/1058667

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